Search Results - "Alami J"

Structural, Mechanical, Tribological, and Electrochemical Behavior of Ti1−xAlxN Coatings Deposited by High-Power Impulse Magnetron Sputtering from a Single Ti/Al Target.

Authors: Lahouij, M. Jaghar, N. Abegunde, O. et al.

Source: Journal of Materials Engineering & Performance; Apr2025, Vol. 34 Issue 8, p7230-7243, 14p

Lateral Performance of a Temporary Bamboo Structure: Design and Experimental Assessment.

Authors: Alami, J. Afshar, M. A. Mazloum, A. A.

Source: Journal of Bamboo & Rattan (Kerala Forest Research Institute). 2021, Vol. 20 Issue 3, p34-48. 15p.

Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering.

Authors: Sarakinos, K. Alami, J. Wuttig, M.

Source: Journal of Physics: D Applied Physics; April 7 2007, Vol. 40 Issue 7, p2108-2114, 7p

The role of backscattered energetic atoms in film growth in reactive magnetron sputtering of chromium nitride.

Authors: Sarakinos, K. Alami, J. Karimi, P. M.

Source: Journal of Physics: D Applied Physics; February 7 2007, Vol. 40 Issue 3, p778-785, 8p

Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge.

Authors: Gylfason, K. B. Alami, J. Helmersson, U.

Source: Journal of Physics: D Applied Physics; September 21 2005, Vol. 38 Issue 18, p3417-3421, 5p

Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge.

Authors: Gudmundsson, J. T. Alami, J. Helmersson, U.

Source: Applied Physics Letters; May 28 2001, Vol. 78 Issue 22, p3427-3429, 3p

Dielectric composite multimodal optimization using a multipopulation cultural algorithm.

Authors: Alami, J. El Imrani, A.

Source: Intelligent Data Analysis. 2008, Vol. 12 Issue 4, p359-378. 20p. 4 Diagrams, 4 Charts, 6 Graphs.

Spatial Electron Density Distribution in a High-Power Pulsed Magnetron Discharge.

Authors: Bohlmark, J. Gudmundsson, J. T. Alami, J.

Source: IEEE Transactions on Plasma Science; Apr2005 Part 1 of 3, Vol. 33 Issue 2, p346-347, 2p

Enhanced ionization sputtering: A concept for superior industrial coatings.

Authors: Alami, J. Maric, Z. Busch, H. et al.

Source: Surface & Coatings Technology. Sep2014, Vol. 255, p43-51. 9p.

Subjects: Ionization (Atomic physics), Magnetron sputtering, Magnetic flux density, Coatings industry, Plasma gases, Evaporation (Chemistry)

The effect of the backscattered energetic atoms on the stress generation and the surface morphology of reactively sputtered vanadium nitride films

Authors: Sarakinos, K. Alami, J. Severin, D. et al.

Source: Thin Solid Films. May2008, Vol. 516 Issue 14, p4568-4573. 6p.

Subjects: Properties of matter, Heat resistant alloys, Sputtering (Physics), Surface roughness

Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

Authors: Alami, J. Eklund, P. Andersson, J.M. et al.

Source: Thin Solid Films. Feb2007, Vol. 515 Issue 7/8, p3434-3438. 5p.

Subjects: Sputtering (Physics), Tailoring, Tantalum films, Silicon

High-power impulse magnetron sputtering of Ti–Si–C thin films from a Ti3SiC2 compound target

Authors: Alami, J. Eklund, P. Emmerlich, J. et al.

Source: Thin Solid Films. Dec2006, Vol. 515 Issue 4, p1731-1736. 6p.

Subjects: Thin films, Electron spectroscopy, Magnetrons, Titanium

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

Authors: Sarakinos, K. Alami, J. Konstantinidis, S.

Source: Surface & Coatings Technology. Feb2010, Vol. 204 Issue 11, p1661-1684. 24p.

Subjects: Magnetron sputtering, Physical vapor deposition, Plasma gases, Ionization (Atomic physics), Surface coatings, Substrates (Materials science), Thin films

Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge

Authors: Gudmundsson, J.T. Alami, J. Helmersson, U.

Source: Surface & Coatings Technology. Dec2002, Vol. 161 Issue 2/3, p249. 8p.

Subjects: Magnetrons, Plasma gases, Sputtering (Physics)

High power pulsed magnetron sputtering: Fundamentals and applications

Authors: Alami, J. Bolz, S. Sarakinos, K.

Source: Journal of Alloys & Compounds. Aug2009, Vol. 483 Issue 1/2, p530-534. 5p.

Subjects: Magnetron sputtering, Metal coating, Nitrides, Mechanical properties of thin films, Electron distribution, Ion bombardment, Electric properties of thin films, Optical properties, Thin films

Mycosis fungoides presenting as vulvar plaques.

Authors: El Alami, J. Le Corre, Y. Battistella, M. et al.

Source: Journal of the European Academy of Dermatology & Venereology. Apr2019, Vol. 33 Issue 4, pe172-e174. 3p.

On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering.

Authors: Alami, J. Sarakinos, K. Uslu, F.

Source: Journal of Physics: D Applied Physics; June 7 2009, Vol. 42 Issue 11, p115204-115204, 1p

On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering.

Authors: Alami, J. Sarakinos, K. Uslu, F.

Source: Journal of Physics: D Applied Physics; January 7 2009, Vol. 42 Issue 1, p015304-015304, 1p

A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering.

Authors: Sarakinos, K. Alami, J. Dukwen, J.

Source: Journal of Physics: D Applied Physics; November 7 2008, Vol. 41 Issue 21, p215301-215301, 1p

On the deposition rate in a high power pulsed magnetron sputtering discharge.

Authors: Alami, J. Sarakinos, K. Mark, G.

Source: Applied Physics Letters; October 9 2006, Vol. 89 Issue 15, p154104-154104, 1p