Search Results - "Gybin, Alexander"

Properties of a highly compensated high-purity germanium.

Authors: Palleti, Pradeep Chandra Seyidov, Palvan Gybin, Alexander et al.

Source: Journal of Materials Science: Materials in Electronics; Jan2024, Vol. 35 Issue 1, p1-12, 12p

A Coupled Approach to Compute the Dislocation Density Development during Czochralski Growth and Its Application to the Growth of High-Purity Germanium (HPGe).

Authors: Miller, Wolfram Sabanskis, Andrejs Gybin, Alexander et al.

Source: Crystals (2073-4352); Oct2023, Vol. 13 Issue 10, p1440, 18p

On the Czochralski growth of SixGe1−x crystals as substrates for strained Ge quantum well heterostructures.

Authors: Subramanian, Aravind N. Richter, Carsten Gybin, Alexander et al.

Source: Journal of Applied Physics; 2/14/2025, Vol. 137 Issue 6, p1-10, 10p

Investigation of Doping Processes to Achieve Highly Doped Czochralski Germanium Ingots.

Authors: Subramanian, Aravind Abrosimov, Nikolay Gybin, Alexander et al.

Source: Journal of Electronic Materials; Aug2023, Vol. 52 Issue 8, p5178-5188, 11p

Development of Large‐Diameter and Very High Purity Ge Crystal Growth Technology for Devices.

Authors: Sumathi, Rajappan Radhakrishnan Gybin, Alexander Gradwohl, Kevin‐P. et al.

Source: Crystal Research & Technology; May2023, Vol. 58 Issue 5, p1-8, 8p

Vacancy Clustering in Dislocation-Free High-Purity Germanium.

Authors: Gradwohl, Kevin-Peter Gybin, Alexander Janicskó-Csáthy, József et al.

Source: Journal of Electronic Materials; Sep2020, Vol. 49 Issue 9, p5097-5103, 7p

Dynamical X‐ray diffraction imaging of voids in dislocation‐free high‐purity germanium single crystals.

Authors: Gradwohl, Kevin-P. Danilewsky, Andreas N. Roder, Melissa et al.

Source: Journal of Applied Crystallography; Aug2020, Vol. 53 Issue 4, p880-884, 5p

Quasi-Transient Calculation of Czochralski Growth of Ge Crystals Using the Software Elmer.

Authors: Miller, Wolfram Abrosimov, Nikolay Fischer, Jörg et al.

Source: Crystals (2073-4352); Jan2020, Vol. 10 Issue 1, p18-18, 1p

Development and morphological analysis of the zone refining process for high purity germanium.

Authors: Palleti, Pradeep Chandra Gybin, Alexander Bergmann, Sabine et al.

Source: Materials Science in Semiconductor Processing; Jan2025, Vol. 185, pN.PAG-N.PAG, 1p