Search Results - "Robison, Rodney L."

Wafer Redeposition Impact on Etch Rate Uniformity in IPYD System.

Authors: Brcka, Jozef Robison, Rodney L.

Source: IEEE Transactions on Plasma Science. Feb2007, Vol. 35 Issue 1, p74-82. 9p. 2 Diagrams, 10 Graphs.

Subjects: Physical vapor deposition, Thermal neutrons, Plasma gases, Electrodes, Argon, Copper

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Embryo-Fetal Developmental and Reproductive Toxicology of Vinyl Chloride in Rats.

Authors: Thornton, Suzanne R. Schroeder, Raymond E. Robison, Rodney L. et al.

Source: Toxicological Sciences. Jul2002, Vol. 68 Issue 1, p207-219. 13p. 2 Diagrams, 14 Charts.