Search Results - "Rummel, B. D."

Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS.

Authors: Rummel, B. D. Klesko, J. P. Meyerson, M. L. et al.

Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2025, Vol. 43 Issue 4, p1-7, 7p

Sources of error and methods to improve accuracy in interface state density analysis using quasi-static capacitance–voltage measurements in wide bandgap semiconductors.

Authors: Rummel, B. D. Cooper, J. A. Morisette, D. T. et al.

Source: Journal of Applied Physics; 9/28/2023, Vol. 134 Issue 12, p1-10, 10p