APA (7th ed.) Citation

Frischmuth, T., Schneider, M., Bogdanović Radović, I., Siketić, Z., Maurer, D., Grille, T., & Schmid, U. (2016). Low temperature deposition of a-SiC: H thin films applying a dual plasma source process. Thin Solid Films, 616, 164. https://doi.org/10.1016/j.tsf.2016.07.030

Chicago Style (17th ed.) Citation

Frischmuth, Tobias, Michael Schneider, Iva Bogdanović Radović, Zdravko Siketić, Daniel Maurer, Thomas Grille, and Ulrich Schmid. "Low Temperature Deposition of A-SiC: H Thin Films Applying a Dual Plasma Source Process." Thin Solid Films 616 (2016): 164. https://doi.org/10.1016/j.tsf.2016.07.030.

MLA (9th ed.) Citation

Frischmuth, Tobias, et al. "Low Temperature Deposition of A-SiC: H Thin Films Applying a Dual Plasma Source Process." Thin Solid Films, vol. 616, 2016, p. 164, https://doi.org/10.1016/j.tsf.2016.07.030.