Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.
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| Title: | Low temperature deposition of a-SiC:H thin films applying a dual plasma source process. |
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| Authors: | Frischmuth, Tobias1, tobias.frischmuth@tuwien.ac.at, Schneider, Michael1, Bogdanović Radović, Iva2, Siketić, Zdravko2, Maurer, Daniel3, Grille, Thomas3, Schmid, Ulrich1 |
| Source: | Thin Solid Films; Oct2016, Vol. 616, p164-171, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00406090 |
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| DOI: | 10.1016/j.tsf.2016.07.030 |
