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Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.

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Title: Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.
Authors: Frischmuth, Tobias1, tobias.frischmuth@tuwien.ac.at, Schneider, Michael1, Bogdanović Radović, Iva2, Siketić, Zdravko2, Maurer, Daniel3, Grille, Thomas3, Schmid, Ulrich1
Source: Thin Solid Films; Oct2016, Vol. 616, p164-171, 8p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 119560125
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=119560125
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.tsf.2016.07.030
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      – Code: eng
        Text: English
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        PageCount: 8
        StartPage: 164
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      – TitleFull: Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.
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            NameFull: Frischmuth, Tobias
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            NameFull: Schneider, Michael
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            NameFull: Bogdanović Radović, Iva
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            NameFull: Siketić, Zdravko
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            NameFull: Maurer, Daniel
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            – D: 01
              M: 10
              Text: Oct2016
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              Y: 2016
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              Value: 616
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