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Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.

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Bibliographic Details
Title: Low temperature deposition of a-SiC:H thin films applying a dual plasma source process.
Authors: Frischmuth, Tobias1, tobias.frischmuth@tuwien.ac.at, Schneider, Michael1, Bogdanović Radović, Iva2, Siketić, Zdravko2, Maurer, Daniel3, Grille, Thomas3, Schmid, Ulrich1
Source: Thin Solid Films; Oct2016, Vol. 616, p164-171, 8p
Database: Applied Science & Technology Source
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