Tsipas, P., Chaitoglou, S., Fragkos, S., Axiotis, M., Lagoyiannis, A., Dimoulas, A., . . . Pintilie, L. (2019). Very large remanent polarization in ferroelectric Hf1-xZrxO2 grown on Ge substrates by plasma assisted atomic oxygen deposition. Applied Physics Letters, 114(11), N.PAG. https://doi.org/10.1063/1.5090036
Chicago Style (17th ed.) CitationTsipas, P., S. Chaitoglou, S. Fragkos, M. Axiotis, A. Lagoyiannis, A. Dimoulas, C. Zacharaki, R. Negrea, and L. Pintilie. "Very Large Remanent Polarization in Ferroelectric Hf1-xZrxO2 Grown on Ge Substrates by Plasma Assisted Atomic Oxygen Deposition." Applied Physics Letters 114, no. 11 (2019): N.PAG. https://doi.org/10.1063/1.5090036.
MLA (9th ed.) CitationTsipas, P., et al. "Very Large Remanent Polarization in Ferroelectric Hf1-xZrxO2 Grown on Ge Substrates by Plasma Assisted Atomic Oxygen Deposition." Applied Physics Letters, vol. 114, no. 11, 2019, p. N.PAG, https://doi.org/10.1063/1.5090036.