Huttunen-Saarivirta, E., Rajala, P., Carpén, L., Wang, J., Liu, F., Ghanbari, E., . . . Macdonald, D. D. (2019). Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]. Journal of The Electrochemical Society, 166(10), Y17. https://doi.org/10.1149/2.1291910jes
Chicago Style (17th ed.) CitationHuttunen-Saarivirta, E., et al. "Response to Comments on E. Huttunen-Saarivirta Et Al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]." Journal of The Electrochemical Society 166, no. 10 (2019): Y17. https://doi.org/10.1149/2.1291910jes.
MLA (9th ed.) CitationHuttunen-Saarivirta, E., et al. "Response to Comments on E. Huttunen-Saarivirta Et Al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]." Journal of The Electrochemical Society, vol. 166, no. 10, 2019, p. Y17, https://doi.org/10.1149/2.1291910jes.