APA (7th ed.) Citation

Fuji, T., Yamaguchi, Y., Suzuki, Y., Mikami, T., & Tanigawa, S. (2020). 15‐2: Gen 10 Excimer Laser Annealing System. SID Symposium Digest of Technical Papers, 51(1), 196. https://doi.org/10.1002/sdtp.13836

Chicago Style (17th ed.) Citation

Fuji, Takahiro, Yoshihiro Yamaguchi, Yuki Suzuki, Takahiro Mikami, and Sadao Tanigawa. "15‐2: Gen 10 Excimer Laser Annealing System." SID Symposium Digest of Technical Papers 51, no. 1 (2020): 196. https://doi.org/10.1002/sdtp.13836.

MLA (9th ed.) Citation

Fuji, Takahiro, et al. "15‐2: Gen 10 Excimer Laser Annealing System." SID Symposium Digest of Technical Papers, vol. 51, no. 1, 2020, p. 196, https://doi.org/10.1002/sdtp.13836.