APA (7th ed.) Citation

Akashi, K., Tanaka, Y., Nakano, Y., Furukawa, R., Ishijima, T., Sueyasu, S., . . . Nakamura, K. (2021). Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma. Plasma Chemistry & Plasma Processing, 41(4), 1121. https://doi.org/10.1007/s11090-021-10169-4

Chicago Style (17th ed.) Citation

Akashi, Keita, Yasunori Tanaka, Y. Nakano, R. Furukawa, T. Ishijima, S. Sueyasu, S. Watanabe, and K. Nakamura. "Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma." Plasma Chemistry & Plasma Processing 41, no. 4 (2021): 1121. https://doi.org/10.1007/s11090-021-10169-4.

MLA (9th ed.) Citation

Akashi, Keita, et al. "Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma." Plasma Chemistry & Plasma Processing, vol. 41, no. 4, 2021, p. 1121, https://doi.org/10.1007/s11090-021-10169-4.