Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma.
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| Title: | Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma. |
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| Authors: | Akashi, Keita1, akashikeita@stu.kanazawa-u.ac.jp, Tanaka, Yasunori1, tanaka@ec.t.kanazawa-u.ac.jp, Nakano, Y.1, Furukawa, R.1, Ishijima, T.1, Sueyasu, S.2, Watanabe, S.2, Nakamura, K.2 |
| Source: | Plasma Chemistry & Plasma Processing; Jul2021, Vol. 41 Issue 4, p1121-1147, 27p |
| Database: | Applied Science & Technology Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 150747292 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Akashi%2C+Keita%22">Akashi, Keita</searchLink><relatesTo>1</relatesTo>, <i>akashikeita@stu.kanazawa-u.ac.jp</i><br /><searchLink fieldCode="AU" term="%22Tanaka%2C+Yasunori%22">Tanaka, Yasunori</searchLink><relatesTo>1</relatesTo>, <i>tanaka@ec.t.kanazawa-u.ac.jp</i><br /><searchLink fieldCode="AU" term="%22Nakano%2C+Y%2E%22">Nakano, Y.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Furukawa%2C+R%2E%22">Furukawa, R.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Ishijima%2C+T%2E%22">Ishijima, T.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Sueyasu%2C+S%2E%22">Sueyasu, S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Watanabe%2C+S%2E%22">Watanabe, S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Nakamura%2C+K%2E%22">Nakamura, K.</searchLink><relatesTo>2</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Plasma+Chemistry+%26+Plasma+Processing%22">Plasma Chemistry & Plasma Processing</searchLink>; Jul2021, Vol. 41 Issue 4, p1121-1147, 27p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=150747292 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s11090-021-10169-4 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 27 StartPage: 1121 Titles: – TitleFull: Effect of Intermittent Injection of Ar/CH4 Quenching Gas on Particle Composition and Size of Si/C Nanoparticles Synthesized by Modulated Induction Thermal Plasma. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Akashi, Keita – PersonEntity: Name: NameFull: Tanaka, Yasunori – PersonEntity: Name: NameFull: Nakano, Y. – PersonEntity: Name: NameFull: Furukawa, R. – PersonEntity: Name: NameFull: Ishijima, T. – PersonEntity: Name: NameFull: Sueyasu, S. – PersonEntity: Name: NameFull: Watanabe, S. – PersonEntity: Name: NameFull: Nakamura, K. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 07 Text: Jul2021 Type: published Y: 2021 Identifiers: – Type: issn-print Value: 02724324 Numbering: – Type: volume Value: 41 – Type: issue Value: 4 Titles: – TitleFull: Plasma Chemistry & Plasma Processing Type: main |
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