APA (7th ed.) Citation

Castillo-Saenz, J., Nedev, N., Valdez-Salas, B., Curiel-Alvarez, M., Mendivil-Palma, M. I., Hernandez-Como, N., . . . Martinez-Guerra, E. (2021). Properties of Al 2 O 3 Thin Films Grown by PE-ALD at Low Temperature Using H 2 O and O 2 Plasma Oxidants. Coatings (2079-6412), 11(10), 1266. https://doi.org/10.3390/coatings11101266

Chicago Style (17th ed.) Citation

Castillo-Saenz, Jhonathan, et al. "Properties of Al 2 O 3 Thin Films Grown by PE-ALD at Low Temperature Using H 2 O and O 2 Plasma Oxidants." Coatings (2079-6412) 11, no. 10 (2021): 1266. https://doi.org/10.3390/coatings11101266.

MLA (9th ed.) Citation

Castillo-Saenz, Jhonathan, et al. "Properties of Al 2 O 3 Thin Films Grown by PE-ALD at Low Temperature Using H 2 O and O 2 Plasma Oxidants." Coatings (2079-6412), vol. 11, no. 10, 2021, p. 1266, https://doi.org/10.3390/coatings11101266.