Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination. - Li, Jinxiong; Ju, Shanshan; Tang, Yupu; Li, Jiye; Li, Xiao; Tian, Xu; Zhu, Jianzhang; Ge, Qingqin; Lu, Lei; Zhang, Shengdong; Wang, Xinwei (Advanced Functional Materials, 2024)