Götz, K., Prihoda, A., Shen, C., Dierner, M., Dallmann, J., Prusch, S., . . . Unruh, T. (2024). Nucleation Behavior of SnS2 on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition. Advanced Materials Interfaces, 11(26), 1. https://doi.org/10.1002/admi.202300990
Chicago Style (17th ed.) CitationGötz, Klaus, Annemarie Prihoda, Chen Shen, Martin Dierner, Johannes Dallmann, Saskia Prusch, Dirk Zahn, Erdmann Spiecker, and Tobias Unruh. "Nucleation Behavior of SnS2 on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition." Advanced Materials Interfaces 11, no. 26 (2024): 1. https://doi.org/10.1002/admi.202300990.
MLA (9th ed.) CitationGötz, Klaus, et al. "Nucleation Behavior of SnS2 on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition." Advanced Materials Interfaces, vol. 11, no. 26, 2024, p. 1, https://doi.org/10.1002/admi.202300990.