APA (7th ed.) Citation

Wang, B., Zhang, J., Liu, H., Yang, H., Wang, Y., Wang, H., . . . Wang, X. (2024). Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films. Coatings (2079-6412), 14(12), 1616. https://doi.org/10.3390/coatings14121616

Chicago Style (17th ed.) Citation

Wang, Bo, et al. "Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films." Coatings (2079-6412) 14, no. 12 (2024): 1616. https://doi.org/10.3390/coatings14121616.

MLA (9th ed.) Citation

Wang, Bo, et al. "Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films." Coatings (2079-6412), vol. 14, no. 12, 2024, p. 1616, https://doi.org/10.3390/coatings14121616.