Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films.
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| Title: | Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films. |
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| Authors: | Wang, Bo1,2,3,4, w18139918346@163.com, Zhang, Jian1,2,3,4, waterscent@163.comyanghg@ciomp.ac.cn, Liu, Hai1,2,3,4, waterscent@163.comwychaos0127@gmail.com, Yang, Haigui1,2,3,4, whf1102218322@163.com, Wang, Yanchao1,2,3,4, panjingjie@ciomp.ac.cn, Wang, Haifeng1,2,3,4, liuzhencl@163.com, Pan, Jingjie1,2,3,4, zf_shen@163.com, Liu, Zhen1,2,3,4, wlgwk2017@163.com, Shen, Zhenfeng1,2,3,4, huhanwen23@mails.ucas.ac.cn, Gao, Wenkai1,2,3,4, zyy15555157812@126.com, Hu, Hanwen1,2,3,4, tanghl@ciomp.ac.cn, Zhao, Yi1,2,3,4, wangtongtong@126.com, Tang, Haolong1,2,3,4, wangxiaoyi1977@sina.com, Wang, Tongtong1,2,3,4, Wang, Xiaoyi1,2,3,4 |
| Source: | Coatings (2079-6412); Dec2024, Vol. 14 Issue 12, p1616, 12p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 20796412 |
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| DOI: | 10.3390/coatings14121616 |
