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Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films.

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Title: Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films.
Authors: Wang, Bo1,2,3,4, w18139918346@163.com, Zhang, Jian1,2,3,4, waterscent@163.comyanghg@ciomp.ac.cn, Liu, Hai1,2,3,4, waterscent@163.comwychaos0127@gmail.com, Yang, Haigui1,2,3,4, whf1102218322@163.com, Wang, Yanchao1,2,3,4, panjingjie@ciomp.ac.cn, Wang, Haifeng1,2,3,4, liuzhencl@163.com, Pan, Jingjie1,2,3,4, zf_shen@163.com, Liu, Zhen1,2,3,4, wlgwk2017@163.com, Shen, Zhenfeng1,2,3,4, huhanwen23@mails.ucas.ac.cn, Gao, Wenkai1,2,3,4, zyy15555157812@126.com, Hu, Hanwen1,2,3,4, tanghl@ciomp.ac.cn, Zhao, Yi1,2,3,4, wangtongtong@126.com, Tang, Haolong1,2,3,4, wangxiaoyi1977@sina.com, Wang, Tongtong1,2,3,4, Wang, Xiaoyi1,2,3,4
Source: Coatings (2079-6412); Dec2024, Vol. 14 Issue 12, p1616, 12p
Database: Applied Science & Technology Source
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An: 181951745
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  Data: Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO 2 Thin Films.
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  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Dec2024, Vol. 14 Issue 12, p1616, 12p
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        Text: English
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            – D: 01
              M: 12
              Text: Dec2024
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