APA (7th ed.) Citation

Ishinokoshi, K., Okano, R., Tanaka, Y., Ishijima, T., & Nakano, Y. (2025). Thermal Plasma-Induced High Temperature Insulation Gas Generation for Dielectric Property Measurement above 3000 K. Plasma Chemistry & Plasma Processing, 45(3), 951. https://doi.org/10.1007/s11090-025-10553-4

Chicago Style (17th ed.) Citation

Ishinokoshi, Koya, Rio Okano, Yasunori Tanaka, Tatsuo Ishijima, and Yusuke Nakano. "Thermal Plasma-Induced High Temperature Insulation Gas Generation for Dielectric Property Measurement Above 3000 K." Plasma Chemistry & Plasma Processing 45, no. 3 (2025): 951. https://doi.org/10.1007/s11090-025-10553-4.

MLA (9th ed.) Citation

Ishinokoshi, Koya, et al. "Thermal Plasma-Induced High Temperature Insulation Gas Generation for Dielectric Property Measurement Above 3000 K." Plasma Chemistry & Plasma Processing, vol. 45, no. 3, 2025, p. 951, https://doi.org/10.1007/s11090-025-10553-4.