APA (7th ed.) Citation

Peng, L., Fan, H., Qi, Y., & Li, J. (2025). Random Forest-Based Prediction of the Optimal Solid Ink Density in Offset Lithography. Applied Sciences (2076-3417), 15(9), 4830. https://doi.org/10.3390/app15094830

Chicago Style (17th ed.) Citation

Peng, Laihu, Hao Fan, Yubao Qi, and Jianqiang Li. "Random Forest-Based Prediction of the Optimal Solid Ink Density in Offset Lithography." Applied Sciences (2076-3417) 15, no. 9 (2025): 4830. https://doi.org/10.3390/app15094830.

MLA (9th ed.) Citation

Peng, Laihu, et al. "Random Forest-Based Prediction of the Optimal Solid Ink Density in Offset Lithography." Applied Sciences (2076-3417), vol. 15, no. 9, 2025, p. 4830, https://doi.org/10.3390/app15094830.