Lee, Y., Yang, H., Hong, T., Shih, H., & Lee, W. (2025). The microstructure and electrical property of M-doped (M = W, Cr) NbN thin films. Journal of Materials Science: Materials in Electronics, 36(16), 1. https://doi.org/10.1007/s10854-025-15025-1
Chicago Style (17th ed.) CitationLee, Ying-Chieh, Hau Yang, Ting-Fu Hong, Huei-Jyun Shih, and Wen-His Lee. "The Microstructure and Electrical Property of M-doped (M = W, Cr) NbN Thin Films." Journal of Materials Science: Materials in Electronics 36, no. 16 (2025): 1. https://doi.org/10.1007/s10854-025-15025-1.
MLA (9th ed.) CitationLee, Ying-Chieh, et al. "The Microstructure and Electrical Property of M-doped (M = W, Cr) NbN Thin Films." Journal of Materials Science: Materials in Electronics, vol. 36, no. 16, 2025, p. 1, https://doi.org/10.1007/s10854-025-15025-1.