Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS. - Rummel, B. D.; Klesko, J. P.; Meyerson, M. L.; Ohlhausen, J. A.; Glaser, C. E.; Binder, A. T.; Dickens, P. T.; Kaplar, R. J. (Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 2025)