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Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach.

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Bibliographic Details
Title: Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach.
Authors: Brault, Pascal1,2, pascal.brault@cnrs.fr, Cavarroc-Weimer, Marjorie3, marjorie.cavarroc@safrangroup.com, Fazeli, Sara1, Froloff, Nicolas1
Source: European Physical Journal - Applied Physics; 2025, Vol. 100, p1-5, 5p
Database: Applied Science & Technology Source
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Description
ISSN:12860042
DOI:10.1051/epjap/2025012