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Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach.

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Title: Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach.
Authors: Brault, Pascal1,2, pascal.brault@cnrs.fr, Cavarroc-Weimer, Marjorie3, marjorie.cavarroc@safrangroup.com, Fazeli, Sara1, Froloff, Nicolas1
Source: European Physical Journal - Applied Physics; 2025, Vol. 100, p1-5, 5p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 190886407
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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      – Type: doi
        Value: 10.1051/epjap/2025012
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      – Code: eng
        Text: English
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        PageCount: 5
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      – TitleFull: Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: a molecular dynamics approach.
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            NameFull: Brault, Pascal
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            NameFull: Fazeli, Sara
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              Value: 100
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