Compensation effect in the kinetics of chemical treatment of GaAs, InAs, GaSb, and InSb using bromine-releasing etching compositions based on H2O2–HBr solutions for the development of effective chemical polishing techniques. - Sheliuk, I. O.; Denysiuk, R. O.; Malanych, G. P.; Tomashyk, V. M.; Boichuk, I. D.; Chaika, M. V.; Melnyk, O. F. (Physics & Chemistry of Solid State, 2025)