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Measurement-Based Estimation of Emission Factors for CF4, C4F6, and C4F8 in Semiconductor Etching Under Varying Plasma Conditions.

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Title: Measurement-Based Estimation of Emission Factors for CF4, C4F6, and C4F8 in Semiconductor Etching Under Varying Plasma Conditions.
Authors: Woo, Jiyun1, Min, Dae Kee2, Lee, Bong-Jae3, Jeon, Eui-Chan4, ecjeon@sejong.ac.kr
Source: Applied Sciences (2076-3417); May2026, Vol. 16 Issue 10, p4746, 18p
Database: Applied Science & Technology Source
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        Value: 10.3390/app16104746
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      – Code: eng
        Text: English
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      – TitleFull: Measurement-Based Estimation of Emission Factors for CF4, C4F6, and C4F8 in Semiconductor Etching Under Varying Plasma Conditions.
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            NameFull: Min, Dae Kee
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            NameFull: Lee, Bong-Jae
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              Text: May2026
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              Y: 2026
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