Nondestructive determination of damage depth profiles in ion-implanted semiconductors by multiple-angle-of-incidence single-wavelength ellipsometry using different optical models.
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| Title: | Nondestructive determination of damage depth profiles in ion-implanted semiconductors by multiple-angle-of-incidence single-wavelength ellipsometry using different optical models. |
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| Authors: | Fried, M., Lohner, T., Jároli, E. |
| Source: | Journal of Applied Physics; September 15 1992, Vol. 72, p2197-2201, 5p |
| Database: | Applied Science & Technology Source |
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