Application of reflectance difference to monitor GaAs wet etching.

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Bibliographic Details
Title: Application of reflectance difference to monitor GaAs wet etching.
Authors: Deppert, Knut, Jönsson, Jan, Samuelson, Lars
Source: Semiconductor Science & Technology; May 1994, Vol. 9 Issue 5, p1148-1152, 5p
Database: Applied Science & Technology Source
Description
ISSN:02681242
DOI:10.1088/0268-1242/9/5/022