APA (7th ed.) Citation

Mahalingam, T., Chitra, J. S. P., & Rajendran, S. (2002). Potentiostatic deposition and characterization of Cu2O thin films. Semiconductor Science & Technology, 17(6), 565. https://doi.org/10.1088/0268-1242/17/6/311

Chicago Style (17th ed.) Citation

Mahalingam, T., J. S. P. Chitra, and S. Rajendran. "Potentiostatic Deposition and Characterization of Cu2O Thin Films." Semiconductor Science & Technology 17, no. 6 (2002): 565. https://doi.org/10.1088/0268-1242/17/6/311.

MLA (9th ed.) Citation

Mahalingam, T., et al. "Potentiostatic Deposition and Characterization of Cu2O Thin Films." Semiconductor Science & Technology, vol. 17, no. 6, 2002, p. 565, https://doi.org/10.1088/0268-1242/17/6/311.