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Potentiostatic deposition and characterization of Cu2O thin films.

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Bibliographic Details
Title: Potentiostatic deposition and characterization of Cu2O thin films.
Authors: Mahalingam, T., Chitra, J. S. P., Rajendran, S.
Source: Semiconductor Science & Technology; June 2002, Vol. 17 Issue 6, p565-569, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500875973
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Potentiostatic deposition and characterization of Cu2O thin films.
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  Data: <searchLink fieldCode="JN" term="%22Semiconductor+Science+%26+Technology%22">Semiconductor Science & Technology</searchLink>; June 2002, Vol. 17 Issue 6, p565-569, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500875973
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      – Type: doi
        Value: 10.1088/0268-1242/17/6/311
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 565
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      – TitleFull: Potentiostatic deposition and characterization of Cu2O thin films.
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            NameFull: Mahalingam, T.
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              Text: June 2002
              Type: published
              Y: 2002
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