Sligte, E. t., Stam, K. M. R. v. d., & Smeets, B. (2004). Barrier-limited surface diffusion in atom lithography. Journal of Applied Physics, 95(4), 1749. https://doi.org/10.1063/1.1638613
Chicago Style (17th ed.) CitationSligte, E. te, K. M. R. van der Stam, and B. Smeets. "Barrier-limited Surface Diffusion in Atom Lithography." Journal of Applied Physics 95, no. 4 (2004): 1749. https://doi.org/10.1063/1.1638613.
MLA (9th ed.) CitationSligte, E. te, et al. "Barrier-limited Surface Diffusion in Atom Lithography." Journal of Applied Physics, vol. 95, no. 4, 2004, p. 1749, https://doi.org/10.1063/1.1638613.
Warning: These citations may not always be 100% accurate.