Atomic layer deposition of thin hafnium oxide films using a carbon free precursor.
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| Title: | Atomic layer deposition of thin hafnium oxide films using a carbon free precursor. |
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| Authors: | Conley, J. F. Jr, Ono, Y., Tweet, D. J. |
| Source: | Journal of Applied Physics; January 1 2003, Vol. 93 Issue 1, p712-718, 7p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.1528306 |
