The effects of Xe on an rf plasma and growth of ZnO films by rf sputtering.

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Bibliographic Details
Title: The effects of Xe on an rf plasma and growth of ZnO films by rf sputtering.
Authors: Nagata, T., Ashida, A., Fujimura, N.
Source: Journal of Applied Physics; 4/15/2004, Vol. 95 Issue 8, p3923-3927, 5p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/1.1682682