The effects of Xe on an rf plasma and growth of ZnO films by rf sputtering.

Saved in:
Bibliographic Details
Title: The effects of Xe on an rf plasma and growth of ZnO films by rf sputtering.
Authors: Nagata, T., Ashida, A., Fujimura, N.
Source: Journal of Applied Physics; 4/15/2004, Vol. 95 Issue 8, p3923-3927, 5p
Database: Applied Science & Technology Source
Be the first to leave a comment!
You must be logged in first