Saitou, M., Okudaira, Y., & Oshikawa, W. (2003). Amorphous Structures and Kinetics of Phosphorous Incorporation in Electrodeposited Ni-P Thin Films. Journal of the Electrochemical Society, 150(3), C140. https://doi.org/10.1149/1.1545459
Chicago Style (17th ed.) CitationSaitou, M., Y. Okudaira, and W. Oshikawa. "Amorphous Structures and Kinetics of Phosphorous Incorporation in Electrodeposited Ni-P Thin Films." Journal of the Electrochemical Society 150, no. 3 (2003): C140. https://doi.org/10.1149/1.1545459.
MLA (9th ed.) CitationSaitou, M., et al. "Amorphous Structures and Kinetics of Phosphorous Incorporation in Electrodeposited Ni-P Thin Films." Journal of the Electrochemical Society, vol. 150, no. 3, 2003, p. C140, https://doi.org/10.1149/1.1545459.