Ionized physical vapor deposition of titanium nitride: A deposition model.
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| Title: | Ionized physical vapor deposition of titanium nitride: A deposition model. |
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| Authors: | Mao, D., Hopwood, J. |
| Source: | Journal of Applied Physics; 7/1/2004, Vol. 96 Issue 1, p820-828, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.1753663 |
