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Ionized physical vapor deposition of titanium nitride: A deposition model.

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Bibliographic Details
Title: Ionized physical vapor deposition of titanium nitride: A deposition model.
Authors: Mao, D., Hopwood, J.
Source: Journal of Applied Physics; 7/1/2004, Vol. 96 Issue 1, p820-828, 9p
Database: Applied Science & Technology Source
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  Availability: 0
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DbLabel: Applied Science & Technology Source
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AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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      – Type: doi
        Value: 10.1063/1.1753663
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      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 820
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      – TitleFull: Ionized physical vapor deposition of titanium nitride: A deposition model.
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            NameFull: Mao, D.
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              Text: 7/1/2004
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              Y: 2004
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