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A CMOS Process-Compatible Wet-Etching Recipe for the High-k Gate Dielectrics Pr2O3 and Pr2-xTixO3.

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Bibliographic Details
Title: A CMOS Process-Compatible Wet-Etching Recipe for the High-k Gate Dielectrics Pr2O3 and Pr2-xTixO3.
Authors: Mane, A. U., Wenger, Ch, Schroeder, T.
Source: Journal of the Electrochemical Society; 2005, Vol. 152 Issue 6, pC399-C402, 4p
Database: Applied Science & Technology Source
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