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Lattice engineering of dielectric heterostructures on Si by isomorphic oxide-on-oxide epitaxy.

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Title: Lattice engineering of dielectric heterostructures on Si by isomorphic oxide-on-oxide epitaxy.
Authors: Schroeder, T., Costina, I., Storck, P.
Source: Journal of Applied Physics; April 15 2008, Vol. 103 Issue 8, p134-144, 11p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501243740
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Lattice engineering of dielectric heterostructures on Si by isomorphic oxide-on-oxide epitaxy.
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  Data: <searchLink fieldCode="AU" term="%22Schroeder%2C+T%2E%22">Schroeder, T.</searchLink><br /><searchLink fieldCode="AU" term="%22Costina%2C+I%2E%22">Costina, I.</searchLink><br /><searchLink fieldCode="AU" term="%22Storck%2C+P%2E%22">Storck, P.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; April 15 2008, Vol. 103 Issue 8, p134-144, 11p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501243740
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      – Type: doi
        Value: 10.1063/1.2906031
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      – Code: eng
        Text: English
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        PageCount: 11
        StartPage: 134
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      – TitleFull: Lattice engineering of dielectric heterostructures on Si by isomorphic oxide-on-oxide epitaxy.
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            NameFull: Schroeder, T.
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            NameFull: Costina, I.
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            NameFull: Storck, P.
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              Text: April 15 2008
              Type: published
              Y: 2008
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              Value: 103
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