APA (7th ed.) Citation

Saitou, M. (2009). Analysis of mass deposit in nickel pulse electrodeposition using an electric circuit model equivalent to electrocrystallization and electric double layer. Journal of Applied Physics, 106(3), 034917-1. https://doi.org/10.1063/1.3195079

Chicago Style (17th ed.) Citation

Saitou, M. "Analysis of Mass Deposit in Nickel Pulse Electrodeposition Using an Electric Circuit Model Equivalent to Electrocrystallization and Electric Double Layer." Journal of Applied Physics 106, no. 3 (2009): 034917-1. https://doi.org/10.1063/1.3195079.

MLA (9th ed.) Citation

Saitou, M. "Analysis of Mass Deposit in Nickel Pulse Electrodeposition Using an Electric Circuit Model Equivalent to Electrocrystallization and Electric Double Layer." Journal of Applied Physics, vol. 106, no. 3, 2009, pp. 034917-1, https://doi.org/10.1063/1.3195079.