About the strain state of different metal oxide layers epitaxially grown on Si(1 11)
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| Title: | About the strain state of different metal oxide layers epitaxially grown on Si(1 11) |
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| Authors: | Zaumseil, P., Schroeder, T. |
| Source: | Journal of Physics: D Applied Physics; February 9 2011, Vol. 44 Issue 5, p055403-1-055403-8, 8p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 501757199 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501757199 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1088/0022-3727/44/5/055403 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 8 StartPage: 055403-1 Titles: – TitleFull: About the strain state of different metal oxide layers epitaxially grown on Si(1 11) Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Zaumseil, P. – PersonEntity: Name: NameFull: Schroeder, T. IsPartOfRelationships: – BibEntity: Dates: – D: 09 M: 02 Text: February 9 2011 Type: published Y: 2011 Identifiers: – Type: issn-print Value: 00223727 Numbering: – Type: volume Value: 44 – Type: issue Value: 5 Titles: – TitleFull: Journal of Physics: D Applied Physics Type: main |
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