APA (7th ed.) Citation

Roedel, R. J., Rowley, K., & Edwards, J. L. (1991). Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs. Journal of the Electrochemical Society, 138, 3120. https://doi.org/10.1149/1.2085379

Chicago Style (17th ed.) Citation

Roedel, R. J., K. Rowley, and J. L. Edwards. "Comparison of Etch Pit Distributions and Cathodoluminescence Images in Semi-insulating GaAs." Journal of the Electrochemical Society 138 (1991): 3120. https://doi.org/10.1149/1.2085379.

MLA (9th ed.) Citation

Roedel, R. J., et al. "Comparison of Etch Pit Distributions and Cathodoluminescence Images in Semi-insulating GaAs." Journal of the Electrochemical Society, vol. 138, 1991, p. 3120, https://doi.org/10.1149/1.2085379.