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Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs.

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Bibliographic Details
Title: Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs.
Authors: Roedel, R. J., Rowley, K., Edwards, J. L.
Source: Journal of the Electrochemical Society; October 1991, Vol. 138, p3120-3125, 6p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501927382
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; October 1991, Vol. 138, p3120-3125, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501927382
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      – Type: doi
        Value: 10.1149/1.2085379
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 3120
    Titles:
      – TitleFull: Comparison of etch pit distributions and cathodoluminescence images in semi-insulating GaAs.
        Type: main
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            NameFull: Roedel, R. J.
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            NameFull: Rowley, K.
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            NameFull: Edwards, J. L.
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            – D: 01
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              Text: October 1991
              Type: published
              Y: 1991
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              Value: 138
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            – TitleFull: Journal of the Electrochemical Society
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