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Electrical properties of high-resistivity nickel-doped silicon.

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Bibliographic Details
Title: Electrical properties of high-resistivity nickel-doped silicon.
Authors: Chua, W. B., Rose, K.
Source: Journal of Applied Physics; May 1970, Vol. 41, p2644-2647, 4p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 516374522
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
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  Data: Electrical properties of high-resistivity nickel-doped silicon.
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  Data: <searchLink fieldCode="AU" term="%22Chua%2C+W%2E+B%2E%22">Chua, W. B.</searchLink><br /><searchLink fieldCode="AU" term="%22Rose%2C+K%2E%22">Rose, K.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; May 1970, Vol. 41, p2644-2647, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=516374522
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1063/1.1659275
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 4
        StartPage: 2644
    Titles:
      – TitleFull: Electrical properties of high-resistivity nickel-doped silicon.
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      – PersonEntity:
          Name:
            NameFull: Chua, W. B.
      – PersonEntity:
          Name:
            NameFull: Rose, K.
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          Dates:
            – D: 02
              M: 05
              Text: May 1970
              Type: published
              Y: 1970
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              Value: 00218979
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              Value: 41
          Titles:
            – TitleFull: Journal of Applied Physics
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