Ohkubo, M., Kachi, T., Hioki, T., & Kawamoto, J. (1989). Oxygen content control for as-deposited YBa2Cu3Ox thin films by oxygen pressure during rapid cooling following laser deposition. Applied Physics Letters, 55(9), 899. https://doi.org/10.1063/1.102449
Chicago Style (17th ed.) CitationOhkubo, M., T. Kachi, T. Hioki, and J. Kawamoto. "Oxygen Content Control for As-deposited YBa2Cu3Ox Thin Films by Oxygen Pressure During Rapid Cooling Following Laser Deposition." Applied Physics Letters 55, no. 9 (1989): 899. https://doi.org/10.1063/1.102449.
MLA (9th ed.) CitationOhkubo, M., et al. "Oxygen Content Control for As-deposited YBa2Cu3Ox Thin Films by Oxygen Pressure During Rapid Cooling Following Laser Deposition." Applied Physics Letters, vol. 55, no. 9, 1989, p. 899, https://doi.org/10.1063/1.102449.