SURFACE ROUGHNESS AND TOPOGRAPHY OF Ni / MICRO-SiC LAYERS: INFLUENCE OF CURRENT DENSITY ON ELECTRODEPOSITION PROCESS.

Saved in:
Bibliographic Details
Title: SURFACE ROUGHNESS AND TOPOGRAPHY OF Ni / MICRO-SiC LAYERS: INFLUENCE OF CURRENT DENSITY ON ELECTRODEPOSITION PROCESS.
Authors: CIUBOTARIU, Alina1 alina.ciubotariu@ugal.ro, BENEA, Lidia1, SAND, Wolfgang2
Source: Annals of the University Dunarea de Jos of Galati: Fascicle IX, Metallurgy & Materials Science. 2015, Vol. 33 Issue 4, p5-10. 6p.
Database: Academic Search Ultimate
FullText Links:
  – Type: pdflink
Text:
  Availability: 0
Header DbId: asn
DbLabel: Academic Search Ultimate
An: 130367201
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: SURFACE ROUGHNESS AND TOPOGRAPHY OF Ni / MICRO-SiC LAYERS: INFLUENCE OF CURRENT DENSITY ON ELECTRODEPOSITION PROCESS.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22CIUBOTARIU%2C+Alina%22">CIUBOTARIU, Alina</searchLink><relatesTo>1</relatesTo><i> alina.ciubotariu@ugal.ro</i><br /><searchLink fieldCode="AR" term="%22BENEA%2C+Lidia%22">BENEA, Lidia</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22SAND%2C+Wolfgang%22">SAND, Wolfgang</searchLink><relatesTo>2</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Annals+of+the+University+Dunarea+de+Jos+of+Galati%3A+Fascicle+IX%2C+Metallurgy+%26+Materials+Science%22">Annals of the University Dunarea de Jos of Galati: Fascicle IX, Metallurgy & Materials Science</searchLink>. 2015, Vol. 33 Issue 4, p5-10. 6p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=130367201
RecordInfo BibRecord:
  BibEntity:
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 6
        StartPage: 5
    Titles:
      – TitleFull: SURFACE ROUGHNESS AND TOPOGRAPHY OF Ni / MICRO-SiC LAYERS: INFLUENCE OF CURRENT DENSITY ON ELECTRODEPOSITION PROCESS.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: CIUBOTARIU, Alina
      – PersonEntity:
          Name:
            NameFull: BENEA, Lidia
      – PersonEntity:
          Name:
            NameFull: SAND, Wolfgang
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 12
              Text: 2015
              Type: published
              Y: 2015
          Identifiers:
            – Type: issn-print
              Value: 26684748
          Numbering:
            – Type: volume
              Value: 33
            – Type: issue
              Value: 4
          Titles:
            – TitleFull: Annals of the University Dunarea de Jos of Galati: Fascicle IX, Metallurgy & Materials Science
              Type: main
ResultId 1