APA (7th ed.) Citation

Zhou, Y., Hou, Y., Nie, Z., Xie, G., Ma, W., Dai, Y., & Ramachandran, P. A. (2019). Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System. Theoretical Foundations of Chemical Engineering, 53(6), 1048. https://doi.org/10.1134/S0040579519060162

Chicago Style (17th ed.) Citation

Zhou, Yangmin, Yanqing Hou, Zhifeng Nie, Gang Xie, Wenhui Ma, Yongnian Dai, and Palghat A. Ramachandran. "Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System." Theoretical Foundations of Chemical Engineering 53, no. 6 (2019): 1048. https://doi.org/10.1134/S0040579519060162.

MLA (9th ed.) Citation

Zhou, Yangmin, et al. "Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System." Theoretical Foundations of Chemical Engineering, vol. 53, no. 6, 2019, p. 1048, https://doi.org/10.1134/S0040579519060162.