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Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System.

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Title: Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System.
Authors: Yangmin Zhou1,2,3 (AUTHOR), Hou, Yanqing1 (AUTHOR) hhouyanqing@163.com, Nie, Zhifeng1,2 (AUTHOR), Xie, Gang1,3 (AUTHOR), Ma, Wenhui1,2 (AUTHOR), Dai, Yongnian1,2 (AUTHOR), Ramachandran, Palghat A.4 (AUTHOR)
Source: Theoretical Foundations of Chemical Engineering. Nov2019, Vol. 53 Issue 6, p1048-1056. 9p. 1 Diagram, 2 Charts, 6 Graphs.
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Yangmin+Zhou%22">Yangmin Zhou</searchLink><relatesTo>1,2,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Hou%2C+Yanqing%22">Hou, Yanqing</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> hhouyanqing@163.com</i><br /><searchLink fieldCode="AR" term="%22Nie%2C+Zhifeng%22">Nie, Zhifeng</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Xie%2C+Gang%22">Xie, Gang</searchLink><relatesTo>1,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ma%2C+Wenhui%22">Ma, Wenhui</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Dai%2C+Yongnian%22">Dai, Yongnian</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ramachandran%2C+Palghat+A%2E%22">Ramachandran, Palghat A.</searchLink><relatesTo>4</relatesTo> (AUTHOR)
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Theoretical+Foundations+of+Chemical+Engineering%22">Theoretical Foundations of Chemical Engineering</searchLink>. Nov2019, Vol. 53 Issue 6, p1048-1056. 9p. 1 Diagram, 2 Charts, 6 Graphs.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=140372374
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1134/S0040579519060162
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 9
        StartPage: 1048
    Titles:
      – TitleFull: Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Yangmin Zhou
      – PersonEntity:
          Name:
            NameFull: Hou, Yanqing
      – PersonEntity:
          Name:
            NameFull: Nie, Zhifeng
      – PersonEntity:
          Name:
            NameFull: Xie, Gang
      – PersonEntity:
          Name:
            NameFull: Ma, Wenhui
      – PersonEntity:
          Name:
            NameFull: Dai, Yongnian
      – PersonEntity:
          Name:
            NameFull: Ramachandran, Palghat A.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 11
              Text: Nov2019
              Type: published
              Y: 2019
          Identifiers:
            – Type: issn-print
              Value: 00405795
          Numbering:
            – Type: volume
              Value: 53
            – Type: issue
              Value: 6
          Titles:
            – TitleFull: Theoretical Foundations of Chemical Engineering
              Type: main
ResultId 1