Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System.
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| Title: | Thermodynamic Simulation of Polycrystalline Silicon Chemical Vapor Deposition in Si–Cl–H System. |
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| Authors: | Yangmin Zhou1,2,3 (AUTHOR), Hou, Yanqing1 (AUTHOR) hhouyanqing@163.com, Nie, Zhifeng1,2 (AUTHOR), Xie, Gang1,3 (AUTHOR), Ma, Wenhui1,2 (AUTHOR), Dai, Yongnian1,2 (AUTHOR), Ramachandran, Palghat A.4 (AUTHOR) |
| Source: | Theoretical Foundations of Chemical Engineering. Nov2019, Vol. 53 Issue 6, p1048-1056. 9p. 1 Diagram, 2 Charts, 6 Graphs. |
| Database: | Academic Search Ultimate |
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